THE UHV4 IS A MODULAR ELECTROSPRAY DEPOSITION SOURCE CAPABLE OF PRODUCING A BEAM OF MOLECULES FROM A ELECTROSPRAYED SOLUTION AT PRESSURES TYPICALLY IN THE 10-8 MBAR RANGE.
UHV COMPATIBLE ELECTROSPRAY DEPOSITION
OUR ELECTROSPRAY SYSTEMS ALLOW THE DEPOSITION OF COMPLEX MOLECULES, TOO FRAGILE TO BE THERMALLY EVAPORATED ON SURFACES FOR STM, XPS, PEEM, AFM...