Our UHV4i-series forms the base unit of all our electrospray deposition sources and systems. The modular design of this base allows you to tailor the source to fit the experimental requirements. The inlet can be upgraded to a heated capillary for example to aid in the desolation of the plume. Additional differentially pumped apertures can be added to reduce the pressure into the UHV region during the deposition. Alternatively, the final element can be removed in order to increase the deposition flux for experiments where the deposition pressure is less crucial.